 Molecular layer deposition, MLD, and atomic layer deposition, ALD, have been used to create hybrid materials with unique properties. By combining the two techniques, it is possible to produce hybrid materials with both inorganic and organic components. This has led to the development of new materials with enhanced performance characteristics such as improved thermal stability, increased mechanical strength, and better electrical conductivity. Additionally, the ability to precisely control the thickness and composition of the layers allows for the creation of complex three-dimensional structures. This article was authored by Pia Sundberg and Merrick Carpennan.