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E-Beam Lithography, Part 2

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Uploaded on Apr 6, 2010

E-beam lithography is the process of directing an electron beam across a resist layer and thereby creating a pattern that can be etched. Structures of 20nm can be produced. This is the technique that is often used to create nano scale waveguides and microring resonators. One type uses an scanning electron microscope equipped with special beam control software. The other far more expensive method is a dedicated e-beam facility that is able to etch structures directly.
This video is part 2 of a 3-part series.

More information on CMDITR's wiki:
http://depts.washington.edu/cmditr/me...

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