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ALD Atomic Layer Deposition - Thin Films and Nanotechnology

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Published on Jul 5, 2012

Video courtesy of Beneq.

ALD is based on surface controlled thin film deposition. During coating, two or more chemical vapors or gaseous precursors react sequentially on the substrate surface, producing a solid thin film. Most ALD coating systems utilize a flow--through traveling wave setup, where an inert carrier gas flows through the system and precursors are injected as very short pulses into this carrier flow. The carrier gas flow takes the precursor pulses as sequential "waves" through the reaction chamber, followed by a pumping line, filtering systems and, eventually, a vacuum pump.

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