 This study investigates the dissolution behavior of silicon SI and aluminum, AL, in feldspar minerals, microcline and albite, when exposed to low molecular weight organic acids, LMWOAs. The results revealed that the concentration of C and AL released from alkali feldspar increased after treatment with LMWOAs, exhibiting non-stoichiometric dissolution. The C-slash-L release ratio from feldspar deviated from the expected value of 3. Among the LMWOAs tested, oxalic acid was found to be more effective in dissolving aluminum, while citric acid showed greater efficacy in dissolving silicon. The composite acid demonstrated the highest capacity for feldspar dissolution. The dissolution data for C and AL in the organic acid solution was fittingly described by a first order equation with high correlation coefficients. The characterization of feldspar powders indicated that the 040 crystal plane of feldspar was particularly susceptible to attack by organic acids. In the presence of these acids, the chemical bonds C, AL, O, C-C, AL, and O-C, AL, O shifted to higher wave numbers. Additionally, the surface corrosion morphology of feldspar exhibited distinct nanostructures, which became more pronounced with increasing exposure time. The reactivity of feldspar increased over time. These findings provide valuable insights into the natural dissolution process of feldspar and offer a new perspective for the study of this phenomenon. This article was authored by Xiaomin Lin, Yiling Yu, Mingfeng Zhong, and others. We are article.tv, links in the description below.