 The combination of atomic layer deposition, ALD, and molecular layer deposition, MLD, has opened up the possibility of creating hybrid materials with unique properties. By using both techniques, it is possible to create complex structures with precise control over thickness and composition. This allows for the production of materials with desired properties such as high strength, corrosion resistance, and electrical conductivity. Furthermore, the use of nanotemplates or post-deposition treatments enables the selective decomposition of certain parts of the structure, resulting in materials with tailored properties. These materials have potential applications in high-end technologies such as photovoltaics, microelectronics, and biomedical devices. This article was authored by Pia Sundberg and Merritt Carpenter.