 Abstract Atomic Layer Deposition, ALD, is a widely used thin film deposition technique with unique advantages such as self-terminating growth, precise thickness control, and excellent deposition quality. ALD has shown great potential for supercapacitors by enabling the construction and surface engineering of novel electrode materials. This review presents a comprehensive outlook on the development, achievements, and design of advanced electrodes involving ALD for realizing high-performance supercapacitors, focusing on understanding the influence of ALD parameters on electrochemical performance and discussing the ALD of nanostructured electrochemically active electrode materials on various templates. The relationship between synthesis procedures and SC properties is analyzed to guide future research in preparing materials for various applications. Future research should leverage the unique advantages of ALD to fabricate new materials and harness unexplored opportunities in the fabrication of advanced generation supercapacitors. This article was authored by Mohamed Zahid Ansari, Iftikar Hussein, Debananda Mohapatra, and others. We are article.tv, links in the description below.