 This study focused on the fabrication of NiO-thin films on both quartz and silicon substrates using RF magnetron spottering. The films were then annealed at different temperatures and analyzed using various techniques such as atomic force microscopy, advanced surface analysis, photo-luminous, and electrical characterization. The results revealed that the NiO films exhibited excellent optical and electrical properties, making them suitable for use in TCO applications. This article was authored by Lea D. Jam, Jams Hitsabagzadeh, Aitfef Gadari, and others.