Physical Vapor Deposition

We have changed this video to say physical vapor deposition as was suggested in the discussions.

The replacement video is available at http://www.youtube.com/watch?v=Ukvs6Rct4w8&feature=player_embedded

Physical Vapor Deposition is a common technique for apply thin films to electronic devices. Chemical reagents are supplied as gases into chamber, or are volatilized and allowed to react or decompose at the surface of as substrate and form a new substance.

Category:

Science & Technology

Tags:

• PVD

[joaninoni]

Why did he say it is a chemical vapour deposition? I was pretty confused myself. Because I know this as a PVD process.

[MrRocketrunner100]

This is NOT chemical vapour deposition (CVD), its Physical Vapour deposition (PVD), or better known as thermal evaporation. In CVD you have a chemical reaction taking place in presence of heat or plasma which causes a film to be deposited i.e. Silicon and carbon forming Silicon carbide. In PVD (also covers sputtering etc...) or thermal evaporation you take a material and heat it up in a vacuum causing it to evaporate and condense on the substrate as a thin film.

[UUmoonmothUU]

Very cool, thanks for such a thorough explanation.

[syafiqmz]

thanks