Wrinkling of a thin film under applied stress -- 4 holes

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Uploaded by on Jan 18, 2009

This is a freestanding 150 nm thick with patterned holes to introduce spatial variations of stress and strain around the holes. An applied remote tensile stress causes the film to wrinkle due to the small thickness of the film. These wrinkles can be used as a mechanical assay. Work performed with Tim Rupert, MIT.

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