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Plasma-assisted atomic layer deposition ALD of Al2O3 from
Al(CH3)3 and O2 plasma. In the first ~0.5 s the emission by the plasma during an ALD cycle is different from the emission during a regular O2 plasma strike. The reason is the (dissociative) excitation of CO, CO2 and H2O reaction products which enter the plasma after being formed at the reactor walls by the ALD surface chemistry. For more details: Heil et al., Appl. Phys. Lett. 89, 131505 (2006).

Category:

Science & Technology

Tags:

• atomic
• layer
• deposition
• ALD
• plasma
• Al2O3