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Lab Report: Dr Charlie Dunnill on Plasma Assisted Chemical Vapour Deposition

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Uploaded by on Jul 4, 2009

Following on from a previous video, Dr Charlie Dunnill of University College London explains how the use of an argon plasma allows the chemical vapour deposition process to be used to deposit thin films onto plastic substrates at room temperature to make functional surfaces on things that cannot withstand the usual high temperatures associated with CVD.

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  • Can you CVD a polymer onto a ceramic substrate?

  • It is great technology and hope to see more videos about that.

  • The plasma gives energy to the precursors which need to decompose in order to react. Nitrogen plasmas are really hard to spark using the kit that we have and oxygen plasmas aren't really helpful as oxides are really easy to form.

  • Are you using the Ar plasma purely to give energy to your CVD precursors? Have you considered oxygen plasmas for oxides or nitrogen plasmas for nitrides?

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