Fabrication of patterned interference filters (Optics Balzers AG)
Process Steps:
Cleaning of Substrate
Spin Coating of Photoresist
Hard Bake
UV Light Exposure in Mask Aligner
Photoresist Development
Filter Deposition by Plasma-Ion- Assisted Deposition
Photoresist Lift-Off
Repeated Processing for production of Filter Arrays
Applications: Color Detection, Multispectral Imaging, Order Sorting Filters, Filters on Photodetectors, ...
www.opticsbalzers.com
Link to this comment:
All Comments (0)