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TNO High Speed Spatial ALD 1nm/second

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Uploaded on Apr 1, 2010

A novel disruptive concept in Atomic Layer Deposition (ALD), developed by Dutch research organization TNO, can achieve breakthrough ultrafast Al2O3 deposition rates of 1 nm/s (currently limited to 0.1 nm/s).
SoLayTec, a spin-off company from TNO, the Dutch organization for applied scientific research, aims to develop and market equipment for High Volume Atomic Layer Deposition (ALD) on solar cells.

www.tno.nl
roger.gortzen@tno.nl

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