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Puretch Photopolymer Space Bag Vacuum Exposure for Photo Etching Demo #2

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Uploaded by on Dec 18, 2008

Puretch photopolymer high resolution etching resist for fine art photo etching and photo circuit boards, PCB. This DIY video will show you how to expose a plate with Puretch photopolymer without the need of a professional UV vacuum contact frame exposing unit. A clear mylar Space Bag® and 500 watt halogen spot light will be used instead. Exposure is for 5.5 minutes, 18" from bulb. Note: a professional UV exposing unit and vacuum frame is recommended for very fine halftone work as there is a slight loss of details in the highlights with the space bag. The space bag is ideal for coarser bitmaps, line work or circuit designs. Use all materials at your own risk. capefearpress.com ©2009

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Uploader Comments (capefearpress)

  • Hi!

    Great video, thank for sharing!

    Could you please explain why space bags cause some loss of detail in highlights?

    Is it because space bags are not as transparent as it`s necessary?

    Thanks in advance !

  • @revaz39 The spacebag can not hold as tight of a vacuum as a professional contact frame exposing unit. Therefore the lightest dots may get undercut a bit and do not etch. This is my observation in testing. I could lighten up on exposure to see if that helps some.

  • The glass stays fixed to the unit.

  • The glass should stay on for safety. It also filters a little UV so if you decide to expose or test without it it's entirely up to you.

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  • Thanks for reply!

    I am a newbie so please excuse me if my questions seem too naive.

    As a beginner I am going to start with space bag ( since it`s more affordable).

    Do this undercut lightest dots cause significant loss of detail?

    Is it possible that these undercut dots were created by the tendency of the space bag`s film to scatter light?

  • do you remove the glass from the front of the work light?

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