This animation shows Silane deposition onto the letters surface through chemical surface reaction using the ACE+ suite of multiphysics software from ESI. These types of surface reaction simulations are commonly used by semiconductor manufacturing engineers to improve their processing speed while insuring that they create a uniform deposition over the wafer surface.
The simulation was created using the following features available in ESI's CFD products: Flow, Chemistry and Spray modules from CFD-ACE+; Tetrahedral volume meshing using CFD-GEOM; Visualization and animation creation with CFD-VIEW.
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