Uploaded by EnterpriseIrelandTV on Nov 9, 2011
Newlambda Technologies
Printing computer chips on silicon is a process that requires the most extreme accuracy and cleanliness, where a master 'mask' pattern is transferred to the silicon wafer in a photographic process.
Printing nanotechnology in this way means that this mask pattern is too tiny to be imaged effectively by any current tools, at least at a speed which would allow the semiconductor manufacturers to maintain their throughput and profitability.
NewLambda Technologies' EUV (extreme ultraviolet) light source products address this problem by giving the tool manufacturer enough EUV light, in a narrow enough pencil beam, to be able to scan these masks and their blank substrates for defects quickly and economically.
The technology behind the products being developed is a self-healing liquid metal coated mirror which is able to collect EUV light close to the hot plasma fireball that creates the photons without getting damaged. The mirror has been tested with a range of laboratory EUV sources and the performance is being optimised for maximum brightness output.
NewLambda Technologies Limited is the new start-up, which will further develop and commercialise the UCD EUV light source technology.
Presenter: Dr. Kenneth Fahy, University College Dublin
Collaborators: Dr. Paul Sheridan, University College Dublin; Prof. Padraig Dunne,
University College Dublin; Dr. Fergal O'Reilly, University College Dublin
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