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Intel Sr VP Manufacturing on the Benefits of 45nm

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Uploaded by on Nov 13, 2007

http://www.uberpulse.com/us/2007/11/intel_manufacturing_boss_warns_of_competi...

At the Intel Penryn launch in San Francisco's Ritz-Carlton hotel on Nov 12th, William Holt explained the "goodness" of moving to a 45-nm process (from 65-nm) and to hafnium-based High-k and Metal Gate transistors. The combination of these 2 technologies provides more than a 20 percent increase in transistor performance and 30% reduction in power consumption. Which leads to Holt charged comment: "for those who do not move [to High-K metal gate], they will have a less performance minded technology". Holt also confirmed that Intel will be moving to emerging lithography for its 32-nm chips. Finally, according to Holt, the new Penryn chips are much "cleaner" as they are the first ones in the industry to be totally lead and halogen free.
http://www.uberpulse.com/us/2007/11/intel_manufacturing_boss_warns_of_competi...

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