IBM, AMD, Samsung, others get together on breakthrough
1:29
Added: 4 years ago
From: ibmcommunity
Views: 5,194
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  • Well, there are many barriers at the moment at 32nm node..It is not so easy to deposit  "a high k" thin film...but in my viewpoint, this processing step is - indeed - a practicle barrier manufacturing and need much optimization!

    Anyway, good job

    femtophysiker 2 years ago

  • THIS IS AMAZING!!!

    boberino22 2 years ago

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