Henniker Scientific

NEW Henniker Scientific Press Release!!

TMC13 Deposition Rate Controller for Thin Film Applications

Press Release : HSP265

Release Date : May 2012

Follow Link : http://tinyurl.com/c2ot9o2

NEW Henniker Scientific Press Release!!

IS40 Ion Source Range for Surface Analysis

Press Release: HSP243

Release Date: April 2012

Follow Link : http://tinyurl.com/738orlg

Thanks to all who visited the Extrel Stand @ Pittcon 2012, We had a fun time in the sunshine!

http://tinyurl.com/7qmc933

NEW Henniker Scientific Press Release!!

Impedans SEMION™ for pulsed plasma diagnostics

Press Release: HSP212

Release Date: March 2012

Follow Link : http://tinyurl.com/7jwmm4o

We are attending Pittcon 2012 http://www.pittcon.org/index.php on behalf of Extrel CMS http://www.extrel.com/ Please visit us on Stand No 761

We shall be represented @ APACT 2012 by speaker Graham Lewis, Extrel CMS on 25/4/12 'Quadrupole mass spectrometers coupled with membrane technology allows for PPT detection levels in difficult ambient air applications.'

Follow http://tinyurl.com/7wjp6b8 for details on conference.

We are now listed on the Vacuum Coating website

http://vacuumcoating.info/henniker-scientific-ltd

Please take a look at our new listing on the CERN COURIER website

http://cerncourier.com/cws/company/C000020936

It's going to be a busy year here at Henniker Scientific Ltd, please take a look at our events pages

Follow Link : http://tinyurl.com/84jsxm3

Thanks to all who visited our stand at TPW 2012 and to all colleagues at the University of Manchester for their excellent organisation!

New Henniker Scientific Press Release!!

The New Tetra Series - Scalable Plasma Surface Modification Equipment

Press Release: HSP159

Release date: January 2012

Follow Link : http://tinyurl.com/7pbpmqg

Happy New Year 2012, to all our customers, partners and friends!!

Season's greetings to all our customers, partners and friends!!

Semion Ion Energy Analyzer RF Bias power cycle demo

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Semion Ion Energy Analyzer RF Bias power cycle demo

Demonstration of the effect of RF bias power cycling on the ion energy distribution and ion flux arriving at the substrate surface in an Argon plasma.

ImpedansTV • 279 views